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Recent Patents on Nanotechnology
ISSN (Print): 1872-2105
ISSN (Online): 2212-4020
VOLUME: 5
ISSUE: 1
DOI: 10.2174/187221011794474921









Recent Progress in Patterned Silicon Nanowire Arrays: Fabrication, Properties and Applications

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Author(s): Yan Zhang, Teng Qiu, Wenjun Zhang and Paul K. Chu
Pages 62-70 (9)
Abstract:
Currently there is great interest in patterned silicon nanowire arrays and applications. The accurately controlled fabrication of patterned silicon nanowire arrays with the desirable axial crystallographic orientation using simpler and quicker ways is very desirable and of great importance to material synthesis and future nanoscale optoelectronic devices that employ silicon. The recent advances in manipulating patterned silicon nanowire arrays and patents are reviewed with a focus on the progress of nanowire fabrication and applications.
Keywords:
Patterned silicon nanowire arrays, chemical vapor deposition, molecular beam epitaxy, thermal evaporation, selfselective electroless plating, Si solar cells, thermal conductivity, field-effect transistor, Fabrication, axial crystallographic orientation, optoelectronic devices, silicon, photoluminescence, physical va-por deposition, polystyrene spheres, polystyrene monolayer mask, etching techniques, Antireflection Property, Photovoltaic Applica-tion, Raman Spectroscopy, Field Electron Emission Prop-erties
Affiliation:
Department of Physics, Southeast University, Nanjing 211189, P. R. China.