Solid State & Microelectronics Technology

Ion Implantation

Author(s): Sunipa Roy*, Chandan Kumar Ghosh*, Sayan Dey* and Abhijit Kumar Pal * .

Pp: 332-346 (15)

DOI: 10.2174/9789815079876123010011

* (Excluding Mailing and Handling)

Abstract

This chapter discusses the ion implantation process of silicon processing technology in depth. The chapter gives an in-depth insight into various aspects of the ion implantation process and ion-implanted silicon systems commonly encountered in a silicon process. After reading this chapter, the readers will have a sound understanding of the ion implantation process and its various aspects.


Keywords: Buried layer, Channeling, Ion implantation, Ion stopping, Range theory, Recoils.

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